Böttner, Th. ; Kräutle, H. ; Kuphal, E. ; Miethe, K. ; Hartnagel, H. L. (1996)
Surface- and sidewall-damage of InP-based optoelectronic devices during reactive ion etching using CH4/H2.
International Conference on Indium Phosphide and Related Materials. Schwäbisch Gmünd (8.1996)
Konferenzveröffentlichung, Bibliographie