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Surface- and sidewall-damage of InP-based optoelectronic devices during reactive ion etching using CH4/H2

Böttner, Th. ; Kräutle, H. ; Kuphal, E. ; Miethe, K. ; Hartnagel, H. L. (1996):
Surface- and sidewall-damage of InP-based optoelectronic devices during reactive ion etching using CH4/H2.
In: International Conference on Indium Phosphide and Related Materials : 8, 1996, Schwäbisch Gmünd ; Proceedings,
[Conference or Workshop Item]

Item Type: Conference or Workshop Item
Erschienen: 1996
Creators: Böttner, Th. ; Kräutle, H. ; Kuphal, E. ; Miethe, K. ; Hartnagel, H. L.
Title: Surface- and sidewall-damage of InP-based optoelectronic devices during reactive ion etching using CH4/H2
Language: English
Book Title: International Conference on Indium Phosphide and Related Materials : 8, 1996, Schwäbisch Gmünd ; Proceedings
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Microwave Electronics
Date Deposited: 19 Nov 2008 16:04
License: [undefiniert]
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