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Surface- and sidewall-damage of InP-based optoelectronic devices during reactive ion etching using CH4/H2

Böttner, Th and Kräutle, and Kuphal, and Miethe, and Hartnagel, (1996):
Surface- and sidewall-damage of InP-based optoelectronic devices during reactive ion etching using CH4/H2.
In: International Conference on Indium Phosphide and Related Materials <8, 1996, Schwäbisch Gmünd>: Proceedings, [Conference or Workshop Item]

Item Type: Conference or Workshop Item
Erschienen: 1996
Creators: Böttner, Th and Kräutle, and Kuphal, and Miethe, and Hartnagel,
Title: Surface- and sidewall-damage of InP-based optoelectronic devices during reactive ion etching using CH4/H2
Language: English
Series Name: International Conference on Indium Phosphide and Related Materials <8, 1996, Schwäbisch Gmünd>: Proceedings
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Microwave Electronics
Date Deposited: 19 Nov 2008 16:04
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