Artikel

Gottwald, P. ; Kräutle, H. ; Szentpali, B. ; Hartnagel, H. L. (2001)
Results on passivation of InP by photo-CVD SiO2 and SiNx obtained by using the low-frequency noise measurement technique.
In: Fluctuation and noise letters, 1
Artikel, Bibliographie

Gottwald, P. ; Kräutle, ; Szentpali, B. ; Kincses, Z. ; Hartnagel, H. L. (1997)
Damage characterization of InP after reactive ion etching using the low-frequency noise measurement technique.
In: Solid state electronics, 41 (4)
Artikel, Bibliographie

Gottwald, P. ; Riemenschneider, R. ; Szentpali, B. ; Hartnagel, H. L. ; Kincses, Z. ; Ruszinko, M. (1995)
Comparison of photo- and plasma-assisted passivating process effects on GaAs devices by means of low-frequency noise measurements.
In: Solid state electronics, 38 (2)
doi: 10.1016/0038-1101(94)00100-T
Artikel, Bibliographie

Konferenzveröffentlichung

Riemenschneider, Rolf ; Gottwald, P. ; Hartnagel, Hans L.
Hrsg.: Bareikis, V. (1995)
Characterisation of SiO2 deposition by low-temperature plasma and photo CVD using low-frequency noise measurements.
13th International Conference on Noise in Physical Systems and 1/f Fluctuations (ICNF'95). Palanga, Lithuania (29.05.1995-03.06.1995)
Konferenzveröffentlichung, Bibliographie