Riemenschneider, Rolf and Gottwald, and Hartnagel, (1995):
Characterisation of SiO2 deposition by low-temperature plasma and photo CVD using low-frequency noise measurements.
In: International Conference on Noise and 1/f Fluctuations: ICNF '95 <1995, Palanga, Litauen>: Proceedings. S. 599, [Conference or Workshop Item]
| Item Type: | Conference or Workshop Item |
|---|---|
| Erschienen: | 1995 |
| Creators: | Riemenschneider, Rolf and Gottwald, and Hartnagel, |
| Title: | Characterisation of SiO2 deposition by low-temperature plasma and photo CVD using low-frequency noise measurements |
| Language: | English |
| Series Name: | International Conference on Noise and 1/f Fluctuations: ICNF '95 <1995, Palanga, Litauen>: Proceedings. S. 599 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Microwave Electronics |
| Date Deposited: | 19 Nov 2008 15:58 |
| License: | [undefiniert] |
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