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Characterisation of SiO2 deposition by low-temperature plasma and photo CVD using low-frequency noise measurements

Riemenschneider, Rolf and Gottwald, and Hartnagel, (1995):
Characterisation of SiO2 deposition by low-temperature plasma and photo CVD using low-frequency noise measurements.
In: International Conference on Noise and 1/f Fluctuations: ICNF '95 <1995, Palanga, Litauen>: Proceedings. S. 599, [Conference or Workshop Item]

Item Type: Conference or Workshop Item
Erschienen: 1995
Creators: Riemenschneider, Rolf and Gottwald, and Hartnagel,
Title: Characterisation of SiO2 deposition by low-temperature plasma and photo CVD using low-frequency noise measurements
Language: English
Series Name: International Conference on Noise and 1/f Fluctuations: ICNF '95 <1995, Palanga, Litauen>: Proceedings. S. 599
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Microwave Electronics
Date Deposited: 19 Nov 2008 15:58
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