Riemenschneider, Rolf ; Gottwald, ; Hartnagel, (1995):
Characterisation of SiO2 deposition by low-temperature plasma and photo CVD using low-frequency noise measurements.
In: International Conference on Noise and 1/f Fluctuations: ICNF '95 <1995, Palanga, Litauen>: Proceedings. S. 599, [Conference or Workshop Item]
Item Type: | Conference or Workshop Item |
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Erschienen: | 1995 |
Creators: | Riemenschneider, Rolf ; Gottwald, ; Hartnagel, |
Title: | Characterisation of SiO2 deposition by low-temperature plasma and photo CVD using low-frequency noise measurements |
Language: | English |
Series: | International Conference on Noise and 1/f Fluctuations: ICNF '95 <1995, Palanga, Litauen>: Proceedings. S. 599 |
Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Microwave Electronics |
Date Deposited: | 19 Nov 2008 15:58 |
License: | [undefiniert] |
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Suche nach Titel in: | TUfind oder in Google |
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