Gottwald, P. and Riemenschneider, and Szentpali, and Hartnagel, and Kincses, and Ruszinko, (1995):
Comparison of photo- and plasma-assisted passivating process effects on GaAs devices by means of low-frequency noise measurements.
In: Solid state electronics. 38 (1995), Nr. 2, S. 413-417, [Article]
| Item Type: | Article |
|---|---|
| Erschienen: | 1995 |
| Creators: | Gottwald, P. and Riemenschneider, and Szentpali, and Hartnagel, and Kincses, and Ruszinko, |
| Title: | Comparison of photo- and plasma-assisted passivating process effects on GaAs devices by means of low-frequency noise measurements |
| Language: | English |
| Journal or Publication Title: | Solid state electronics. 38 (1995), Nr. 2, S. 413-417 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Microwave Electronics |
| Date Deposited: | 19 Nov 2008 16:05 |
| License: | [undefiniert] |
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