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Gottwald, P. and Kräutle, and Szentpáli, and Kincses, and Hartnagel, (1997):
Damage characterization of InP after reactive ion etching using the low-frequency noise measurement technique.
In: Solid-state electronics. 41 (1997), No. 4, S. 539-545, [Article]

Böttner, Th and Kräutle, and Kuphal, and Miethe, and Hartnagel, (1996):
Surface- and sidewall-damage of InP-based optoelectronic devices during reactive ion etching using CH4/H2.
In: International Conference on Indium Phosphide and Related Materials <8, 1996, Schwäbisch Gmünd>: Proceedings, [Conference or Workshop Item]

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