TU Darmstadt / ULB / TUbiblio

Browse by Person

Up a level
Export as [feed] Atom [feed] RSS 1.0 [feed] RSS 2.0
Group by: No Grouping | Item Type | Date | Language
Number of items: 2.

Gottwald, P. and Kräutle, and Szentpáli, and Kincses, and Hartnagel, (1997):
Damage characterization of InP after reactive ion etching using the low-frequency noise measurement technique.
In: Solid-state electronics. 41 (1997), No. 4, S. 539-545, [Article]

Böttner, Th and Kräutle, and Kuphal, and Miethe, and Hartnagel, (1996):
Surface- and sidewall-damage of InP-based optoelectronic devices during reactive ion etching using CH4/H2.
In: International Conference on Indium Phosphide and Related Materials <8, 1996, Schwäbisch Gmünd>: Proceedings, [Conference or Workshop Item]

This list was generated on Tue Jan 19 02:40:10 2021 CET.