Englisch

Radinger, Hannes ; Connor, Paula ; Tengeler, Sven ; Stark, Robert W. ; Jaegermann, Wolfram ; Kaiser, Bernhard (2021)
Importance of Nickel Oxide Lattice Defects for Efficient Oxygen Evolution Reaction.
In: Chemistry of Materials, 33 (21)
doi: 10.1021/acs.chemmater.1c02406
Artikel, Bibliographie

Fingerle, Mathias ; Tengeler, Sven ; Calvet, Wolfram ; Mayer, Thomas ; Jaegermann, Wolfram (2018)
Water Interaction with Sputter-Deposited Nickel Oxide on n-Si Photoanode: Cryo Photoelectron Spectroscopy on Adsorbed Water in the Frozen Electrolyte Approach.
In: Journal of The Electrochemical Society, 165 (4)
doi: 10.1149/2.0191804jes
Artikel, Bibliographie

Tengeler, Sven ; Fingerle, Mathias ; Calvet, Wolfram ; Steinert, Céline ; Kaiser, Bernhard ; Mayer, Thomas ; Jaegermann, Wolfram (2018)
The Impact of Different Si Surface Terminations in the (001) n-Si/NiOx Heterojunction on the Oxygen Evolution Reaction (OER) by XPS and Electrochemical Methods.
In: Journal of The Electrochemical Society, 165 (4)
doi: 10.1149/2.0151804jes
Artikel, Bibliographie

Tengeler, Sven ; Kaiser, Bernhard ; Ferro, Gabriel ; Chaussende, Didier ; Jaegermann, Wolfram (2018)
The (001) 3C SiC surface termination and band structure after common wet chemical etching procedures, stated by XPS, LEED, and HREELS.
In: Applied Surface Science, 427
doi: 10.1016/j.apsusc.2017.08.220
Artikel, Bibliographie

Tengeler, Sven ; Kaiser, Bernhard ; Chaussende, Didier ; Jaegermann, Wolfram (2017)
(001) 3C SiC/Ni contact interface: In situ XPS observation of annealing induced Ni2Si formation and the resulting barrier height changes.
In: Applied Surface Science, 400
doi: 10.1016/j.apsusc.2016.12.136
Artikel, Bibliographie

Tengeler, Sven (2017)
Cubic Silicon Carbide For Direct Photoelectrochemical Water Splitting.
Technische Universität Darmstadt
Dissertation, Erstveröffentlichung