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Number of items: 5.

Fingerle, Mathias ; Tengeler, Sven ; Calvet, Wolfram ; Mayer, Thomas ; Jaegermann, Wolfram (2018):
Water Interaction with Sputter-Deposited Nickel Oxide on n-Si Photoanode: Cryo Photoelectron Spectroscopy on Adsorbed Water in the Frozen Electrolyte Approach.
In: Journal of The Electrochemical Society, 165 (4), pp. H3148-H3153. Electrochemical Society Publishing, ISSN 0013-4651,
DOI: 10.1149/2.0191804jes,

Tengeler, Sven ; Fingerle, Mathias ; Calvet, Wolfram ; Steinert, Céline ; Kaiser, Bernhard ; Mayer, Thomas ; Jaegermann, Wolfram (2018):
The Impact of Different Si Surface Terminations in the (001) n-Si/NiOx Heterojunction on the Oxygen Evolution Reaction (OER) by XPS and Electrochemical Methods.
In: Journal of The Electrochemical Society, 165 (4), pp. H3122-H3130. ISSN 0013-4651,
DOI: 10.1149/2.0151804jes,

Tengeler, Sven ; Kaiser, Bernhard ; Ferro, Gabriel ; Chaussende, Didier ; Jaegermann, Wolfram (2018):
The (001) 3C SiC surface termination and band structure after common wet chemical etching procedures, stated by XPS, LEED, and HREELS.
In: Applied Surface Science, 427, pp. 480-485. Elsevier Science Publishing, ISSN 01694332,
DOI: 10.1016/j.apsusc.2017.08.220,

Tengeler, Sven ; Kaiser, Bernhard ; Chaussende, Didier ; Jaegermann, Wolfram (2017):
(001) 3C SiC/Ni contact interface: In situ XPS observation of annealing induced Ni2Si formation and the resulting barrier height changes.
In: Applied Surface Science, 400, pp. 6-13. Elsevier Science Publishing, ISSN 01694332,
DOI: 10.1016/j.apsusc.2016.12.136,

Tengeler, Sven (2017):
Cubic Silicon Carbide For Direct Photoelectrochemical Water Splitting.
Darmstadt, TUprints, Technische Universität,
[Ph.D. Thesis]

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