TU Darmstadt / ULB / TUbiblio

Blättern nach Person

Ebene hoch
Gruppiere nach: Keine Gruppierung | Typ des Eintrags | Publikationsjahr | Sprache
Anzahl der Einträge: 5.

Fingerle, Mathias ; Tengeler, Sven ; Calvet, Wolfram ; Mayer, Thomas ; Jaegermann, Wolfram :
Water Interaction with Sputter-Deposited Nickel Oxide on n-Si Photoanode: Cryo Photoelectron Spectroscopy on Adsorbed Water in the Frozen Electrolyte Approach.
[Online-Edition: https://doi.org/10.1149/2.0191804jes]
In: Journal of The Electrochemical Society, 165 (4) H3148-H3153. ISSN 0013-4651
[Artikel] , (2018)

Tengeler, Sven ; Fingerle, Mathias ; Calvet, Wolfram ; Steinert, Céline ; Kaiser, Bernhard ; Mayer, Thomas ; Jaegermann, Wolfram :
The Impact of Different Si Surface Terminations in the (001) n-Si/NiOx Heterojunction on the Oxygen Evolution Reaction (OER) by XPS and Electrochemical Methods.
[Online-Edition: https://doi.org/10.1149/2.0151804jes]
In: Journal of The Electrochemical Society, 165 (4) H3122-H3130. ISSN 0013-4651
[Artikel] , (2018)

Tengeler, Sven ; Kaiser, Bernhard ; Ferro, Gabriel ; Chaussende, Didier ; Jaegermann, Wolfram :
The (001) 3C SiC surface termination and band structure after common wet chemical etching procedures, stated by XPS, LEED, and HREELS.
[Online-Edition: https://doi.org/10.1016/j.apsusc.2017.08.220]
In: Applied Surface Science, 427 S. 480-485. ISSN 01694332
[Artikel] , (2018)

Tengeler, Sven ; Kaiser, Bernhard ; Chaussende, Didier ; Jaegermann, Wolfram :
(001) 3C SiC/Ni contact interface: In situ XPS observation of annealing induced Ni2Si formation and the resulting barrier height changes.
[Online-Edition: https://doi.org/10.1016/j.apsusc.2016.12.136]
In: Applied Surface Science, 400 S. 6-13. ISSN 01694332
[Artikel] , (2017)

Tengeler, Sven :
Cubic Silicon Carbide For Direct Photoelectrochemical Water Splitting.
[Online-Edition: http://tuprints.ulb.tu-darmstadt.de/6985]
TUprints , Darmstadt
[Dissertation], (2017)

Diese Liste wurde am Tue Feb 19 03:07:48 2019 CET generiert.