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Water Interaction with Sputter-Deposited Nickel Oxide on n-Si Photoanode: Cryo Photoelectron Spectroscopy on Adsorbed Water in the Frozen Electrolyte Approach

Fingerle, Mathias and Tengeler, Sven and Calvet, Wolfram and Mayer, Thomas and Jaegermann, Wolfram (2018):
Water Interaction with Sputter-Deposited Nickel Oxide on n-Si Photoanode: Cryo Photoelectron Spectroscopy on Adsorbed Water in the Frozen Electrolyte Approach.
In: Journal of The Electrochemical Society, 165 (4), Electrochemical Society Publishing, pp. H3148-H3153, ISSN 0013-4651,
DOI: 10.1149/2.0191804jes,
[Online-Edition: https://doi.org/10.1149/2.0191804jes],
[Article]

Abstract

The interaction of water with a magnetron-sputtered nickel oxide thin film on an n-type silicon photoanode is investigated in perspective to oxygen evolution. The substrate was exposed in-situ stepwise to gas phase water up to 10 L at liquid N2 temperature and analyzed via X-ray and UV photoelectron spectroscopy in the so called frozen electrolyte approach. Photoemission of the pristine NiOx layer shows the presence of stoichiometric NiO and Ni2O3 as well as of non-stoichiometric phases. In the monolayer range, molecular and dissociative adsorption is detected assigned to the NiO respective Ni2O3 phase. Initially, the emission of the molecular adsorbed water species interacting with NiO is found at 0.8 eV lower binding energies as compared to water related emission for higher coverages with binding energies commonly assigned to H2O-H2O interaction. In addition to the chemical analysis, the electronic structure of the n-Si/SiOx/NiOx/H2O photoanode is measured and discussed.

Item Type: Article
Erschienen: 2018
Creators: Fingerle, Mathias and Tengeler, Sven and Calvet, Wolfram and Mayer, Thomas and Jaegermann, Wolfram
Title: Water Interaction with Sputter-Deposited Nickel Oxide on n-Si Photoanode: Cryo Photoelectron Spectroscopy on Adsorbed Water in the Frozen Electrolyte Approach
Language: English
Abstract:

The interaction of water with a magnetron-sputtered nickel oxide thin film on an n-type silicon photoanode is investigated in perspective to oxygen evolution. The substrate was exposed in-situ stepwise to gas phase water up to 10 L at liquid N2 temperature and analyzed via X-ray and UV photoelectron spectroscopy in the so called frozen electrolyte approach. Photoemission of the pristine NiOx layer shows the presence of stoichiometric NiO and Ni2O3 as well as of non-stoichiometric phases. In the monolayer range, molecular and dissociative adsorption is detected assigned to the NiO respective Ni2O3 phase. Initially, the emission of the molecular adsorbed water species interacting with NiO is found at 0.8 eV lower binding energies as compared to water related emission for higher coverages with binding energies commonly assigned to H2O-H2O interaction. In addition to the chemical analysis, the electronic structure of the n-Si/SiOx/NiOx/H2O photoanode is measured and discussed.

Journal or Publication Title: Journal of The Electrochemical Society
Volume: 165
Number: 4
Publisher: Electrochemical Society Publishing
Uncontrolled Keywords: nickel oxide, photocatalysis, photoemission
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Surface Science
Date Deposited: 22 Feb 2018 13:34
DOI: 10.1149/2.0191804jes
Official URL: https://doi.org/10.1149/2.0191804jes
Funders: Financial support through the project “fundamentals of electro-chemical phase boundaries at semiconductor/electrolyte interfaces” GEP-HE funded by the German Federal Ministry of Education and Research BMBF under contract 13XP5023A is gratefully acknowled., Financial support by the European Union under the a-leaf project (732840-A-LEAF) is gratefully acknowledged.nancial support
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