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Anzahl der Einträge: 2.
2001
Volz, K. ; Klatt, Ch. ; Ensinger, W. (2001)
Heteroepitaxial SiC films grown in Si by CH4 plasma immersion ion implantation: Conditions and mechanisms of their formation.
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, (175-177)
doi: 10.1016/S0168-583X(00)00629-7
Artikel, Bibliographie
2000
Volz, K. ; Klatt, Ch. ; Ensinger, Wolfgang (2000)
Composition and structure of SiCx:H Films Formed by Plasma Immersion Ion Implantation from a Methane Plasma.
In: Mat. Res. Soc. Symp. Proc. 609
Artikel, Bibliographie
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