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Number of items: 5.

Deyu, Getnet Kacha and Hunka, Jonas and Roussel, Hervé and Brötz, Joachim and Bellet, Daniel and Klein, Andreas (2019):
Electrical Properties of Low-Temperature Processed Sn-Doped In2O3 Thin Films: The Role of Microstructure and Oxygen Content and the Potential of Defect Modulation Doping.
In: Materials, 12 (14), p. 2232, ISSN 1996-1944,
DOI: 10.3390/ma12142232,
[Online-Edition: https://doi.org/10.3390/ma12142232],
[Article]

Deyu, Getnet Kacha and Hunka, Jonas and Roussel, Hervé and Brötz, Joachim and Bellet, Daniel and Klein, Andreas (2019):
Electrical Properties of Low-Temperature Processed Sn-Doped In₂O₃ Thin Films: The Role of Microstructure and Oxygen Content and the Potential of Defect Modulation Doping.
In: Materials, 12 (14), MDPI, ISSN 1996-1944,
DOI: 10.3390/ma12142232,
[Online-Edition: https://doi.org/10.3390/ma12142232],
[Article]

Zhang, Shan-Ting and Rouvière, Jean-Luc and Consonni, Vincent and Roussel, Hervé and Rapenne, Laetitia and Pernot, Etienne and Muñoz-Rojas, David and Klein, Andreas and Bellet, Daniel (2017):
High quality epitaxial fluorine-doped SnO2 films by ultrasonic spray pyrolysis: Structural and physical property investigation.
In: Materials & Design, 132Elsevier Science Publishing, pp. 518-525, ISSN 02641275,
[Online-Edition: https://doi.org/10.1016/j.matdes.2017.07.037],
[Article]

Zhang, Shan-Ting and Roussel, Hervé and Chaix-Pluchery, Odette and Langlet, Michel and Muñoz-Rojas, David and Bellet, Daniel and Klein, Andreas (2017):
Polymorphism of the Blocking TiO2 Layer Deposited on F:SnO2 and Its Influence on the Interfacial Energetic Alignment.
In: The Journal of Physical Chemistry C, 121 (32), American Chemical Society Publications, pp. 17305-17313, ISSN 1932-7447,
[Online-Edition: https://doi.org/10.1021/acs.jpcc.7b04893],
[Article]

Dusciac, Dorin and Brizé, Virginie and Chazalviel, Jean-Noël and Lai, Yun-Feng and Roussel, Hervé and Blonkowski, Serge and Schafranek, Robert and Klein, Andreas and Henry de Villeneuve, Catherine and Allongue, Philippe and Ozanam, François and Dubourdieu, Catherine (2012):
Organic Grafting on Si for Interfacial SiO2 Growth Inhibition During Chemical Vapor Deposition of HfO2.
In: Chemistry of Materials, 24 (16), ACS Publications, pp. 3135-3142, ISSN 0897-4756,
[Online-Edition: http://dx.doi.org/10.1021/cm301247v],
[Article]

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