Hurley, P. K. and Pijolat, M. and Cherkaoui, K. and O'Connor, E. and O'Connell, D. and Negara, M. A. and Lemme, M. C. and Gottlob, D. B. and Schmidt, M. and Stegmaier, K. and Schwalke, Udo and Hall, S. and Buiu, O. and Engstrom, O. and Newcomb, S. B. (2007):
The Formation and Characterisation of Lanthanum Oxide Based Si/High-k/NiSi Gate Stacks by Electron-Beam Evaporation: An Examination of In-Situ Amorphous Silicon Capping and NiSi Formation.
In: ECS Transactions, 11 (4), pp. 145-156. [Article]