Browse by Person
![]() | Up a level |
Jump to: 1993
Number of items: 1.
1993
Wechsler, K. and Rangelow, I. and Borkowicz, Z. and Durst, F. and Kadinski, L. and Schäfer, M. (1993):
Experimental and Numerical Study of the Effects of Neutral Transport and Chemical Kinetics on Plasma Etching System CF4/Si.
In: Proceedings of International Symposium on Plasma Etching, pp. 909-914, [Conference or Workshop Item]