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Conference or Workshop Item

Wechsler, K. and Rangelow, I. and Borkowicz, Z. and Durst, F. and Kadinski, L. and Schäfer, M. (1993):
Experimental and Numerical Study of the Effects of Neutral Transport and Chemical Kinetics on Plasma Etching System CF4/Si.
In: Proceedings of International Symposium on Plasma Etching, pp. 909-914, [Conference or Workshop Item]

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