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Fabrication and Simulation of Electrically Reconfigurable Dual Metal-gate Planar Field-effect Transistors for Dopant-free CMOS

Krauss, Tillmann and Wessely, Frank and Schwalke, Udo (2017):
Fabrication and Simulation of Electrically Reconfigurable Dual Metal-gate Planar Field-effect Transistors for Dopant-free CMOS.
In: 12th International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS), [Online-Edition: https://doi.org/10.1109/DTIS.2017.7930155],
[Article]

Item Type: Article
Erschienen: 2017
Creators: Krauss, Tillmann and Wessely, Frank and Schwalke, Udo
Title: Fabrication and Simulation of Electrically Reconfigurable Dual Metal-gate Planar Field-effect Transistors for Dopant-free CMOS
Language: English
Journal or Publication Title: 12th International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS)
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Event Title: 12th International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS)
Event Location: Palma de Mallorca, Spain
Event Dates: 04.-06.04.2017
Date Deposited: 04 Jul 2017 08:09
Official URL: https://doi.org/10.1109/DTIS.2017.7930155
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