Kim-Ngan, Nhu-T. H. ; Havela, L. ; Adamska, A. M. ; Danis, S. ; Pesicka, J. ; Macl, J. ; Eloirdi, R. ; Huber, F. ; Gouder, T. ; Balogh, A. G. (2011)
Characterization of U-based thin films: the UFe2+xcase.
In: Journal of Physics: Conference Series, 303 (1)
doi: 10.1088/1742-6596/303/1/012012
Artikel, Bibliographie
Dies ist die neueste Version dieses Eintrags.
Kurzbeschreibung (Abstract)
We have characterized UFe2+x films prepared by sputter deposition onto fused silica (SiO2) and Si(111) substrates with the film thickness ranging from 75 nm to 900 nm. The Xray diffraction results showed an amorphous character of the deposited material. Some of the films showed in addition a pattern of highly textured cubic Laves phase. Rutherford Backscattering Spectroscopy with 2 MeV He+ ions has been used to determine the composition, thickness and concentration depth profile of the films. A large ageing affect was observed within 1 month after that the films were exposed to air. Magnetic measurements revealed TC increasing with relative Fe concentration and reaching approx. 450 K in UFe3.0.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2011 |
| Autor(en): | Kim-Ngan, Nhu-T. H. ; Havela, L. ; Adamska, A. M. ; Danis, S. ; Pesicka, J. ; Macl, J. ; Eloirdi, R. ; Huber, F. ; Gouder, T. ; Balogh, A. G. |
| Art des Eintrags: | Bibliographie |
| Titel: | Characterization of U-based thin films: the UFe2+xcase |
| Sprache: | Englisch |
| Publikationsjahr: | 2011 |
| Verlag: | IOP Publishing |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Journal of Physics: Conference Series |
| Jahrgang/Volume einer Zeitschrift: | 303 |
| (Heft-)Nummer: | 1 |
| DOI: | 10.1088/1742-6596/303/1/012012 |
| Zugehörige Links: | |
| Kurzbeschreibung (Abstract): | We have characterized UFe2+x films prepared by sputter deposition onto fused silica (SiO2) and Si(111) substrates with the film thickness ranging from 75 nm to 900 nm. The Xray diffraction results showed an amorphous character of the deposited material. Some of the films showed in addition a pattern of highly textured cubic Laves phase. Rutherford Backscattering Spectroscopy with 2 MeV He+ ions has been used to determine the composition, thickness and concentration depth profile of the films. A large ageing affect was observed within 1 month after that the films were exposed to air. Magnetic measurements revealed TC increasing with relative Fe concentration and reaching approx. 450 K in UFe3.0. |
| Zusätzliche Informationen: | Joint European Magnetic Symposia – JEMS 2010 |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik |
| Hinterlegungsdatum: | 12 Dez 2012 12:23 |
| Letzte Änderung: | 24 Jan 2024 07:27 |
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Verfügbare Versionen dieses Eintrags
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Characterization of U-based thin films: the UFe₂₊ₓ case. (deposited 23 Jan 2024 10:05)
- Characterization of U-based thin films: the UFe2+xcase. (deposited 12 Dez 2012 12:23) [Gegenwärtig angezeigt]
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