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Gate Engineering for High-K Dielectric and Ultra-thin Gate Oxide CMOS

Komaragiri, Rama Subrahmanyam and Zaunert, Florian and Schwalke, Udo (2004):
Gate Engineering for High-K Dielectric and Ultra-thin Gate Oxide CMOS.
In: 11th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE), Veldhoven, Niederlande, 24.-25.11.2004, [Conference or Workshop Item]

Item Type: Conference or Workshop Item
Erschienen: 2004
Creators: Komaragiri, Rama Subrahmanyam and Zaunert, Florian and Schwalke, Udo
Title: Gate Engineering for High-K Dielectric and Ultra-thin Gate Oxide CMOS
Language: English
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Event Title: 11th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE)
Event Location: Veldhoven, Niederlande
Event Dates: 24.-25.11.2004
Date Deposited: 20 Nov 2008 08:24
License: [undefiniert]
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