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Wechsler, K. ; Rangelow, I. ; Borkowicz, Z. ; Durst, F. ; Kadinski, L. ; Schäfer, M. (1993):
Experimental and Numerical Study of the Effects of Neutral Transport and Chemical Kinetics on Plasma Etching System CF4/Si.
In: Proceedings of International Symposium on Plasma Etching, pp. 909-914,
[Conference or Workshop Item]

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