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Böttner, Th. ; Kräutle, H. ; Kuphal, E. ; Miethe, K. ; Hartnagel, H. L. (1996):
Surface- and sidewall-damage of InP-based optoelectronic devices during reactive ion etching using CH4/H2.
In: International Conference on Indium Phosphide and Related Materials : 8, 1996, Schwäbisch Gmünd ; Proceedings,
[Conference or Workshop Item]

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