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Wischmeyer, Frank and Niemann, E. and Hartnagel, H. L. (1999):
Improvements of the SiC homoepitaxy process in a horizont cold-wall CVD reactor.
28, In: Journal of electronic materials, pp. 173-177, [Article]

Wischmeyer, Frank and Horn, and Niemann, E. and Hartnagel, H. L. (1996):
Rastertunnelmikroskopie als Methode zur Untersuchung des Interfaces zwischen CVD-gewachsenem 3C-SiC und Silizium.
In: Deutsche Physikalische Gesellschaft: Frühjahrstagung <1996, Regensburg>; Tagungsbd, [Conference or Workshop Item]

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