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Sharma, Akhil and Verheijen, Marcel A. and Wu, Longfei and Karwal, Saurabh and Vandalon, Vincent and Knoops, Harm C. M. and Sundaram, Ravi S. and Hofmann, Jan P. and Kessels, W. M. M. (Erwin) and Bol, Ageeth A. (2018):
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology.
In: Nanoscale, (18), 10. pp. 8615-8627, ISSN 2040-3364,
DOI: 10.1039/C8NR02339E,
[Online-Edition: https://doi.org/10.1039/C8NR02339E],
[Article]

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