TU Darmstadt / ULB / TUbiblio

Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology

Sharma, Akhil and Verheijen, Marcel A. and Wu, Longfei and Karwal, Saurabh and Vandalon, Vincent and Knoops, Harm C. M. and Sundaram, Ravi S. and Hofmann, Jan P. and Kessels, W. M. M. (Erwin) and Bol, Ageeth A. (2018):
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology.
In: Nanoscale, (18), 10. pp. 8615-8627, ISSN 2040-3364,
DOI: 10.1039/C8NR02339E,
[Online-Edition: https://doi.org/10.1039/C8NR02339E],
[Article]

Item Type: Article
Erschienen: 2018
Creators: Sharma, Akhil and Verheijen, Marcel A. and Wu, Longfei and Karwal, Saurabh and Vandalon, Vincent and Knoops, Harm C. M. and Sundaram, Ravi S. and Hofmann, Jan P. and Kessels, W. M. M. (Erwin) and Bol, Ageeth A.
Title: Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Language: English
Journal or Publication Title: Nanoscale
Journal volume: 10
Number: 18
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Surface Science
Date Deposited: 07 Jul 2020 05:25
DOI: 10.1039/C8NR02339E
Official URL: https://doi.org/10.1039/C8NR02339E
Export:
Suche nach Titel in: TUfind oder in Google
Send an inquiry Send an inquiry

Options (only for editors)
Show editorial Details Show editorial Details