Baake, O. ; Fainer, N. I. ; Hoffmann, P. S. ; Kosinova, M. L. ; Rumyantsev, Y. M. ; Trunova, V. A. ; Klein, Andreas ; Ensinger, W. ; Pollakowski, B. ; Beckhoff, B. ; Ulm, G. (2009)
Chemical characterization of SiCxNy nanolayers by FTIR-and Raman spectroscopy, XPS and TXRF-NEXAFS.
In: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 603 (1-2)
doi: 10.1016/j.nima.2009.03.007
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
SiCxNy nanolayers were synthesized by a remote plasma enhanced chemical vapour deposition (RPECVD) method and chemically characterized by Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and near-edge X-ray absorption fine structure investigations in total reflection X-ray fluorescence geometry (TXRF-NEXAFS). The results are compared with those obtained for standard samples SiC and Si3N4 (and with spectra from the literature). As a first result, two or more compounds containing Si-N bonds (not Si3N4), one compound with a Si-C bond (not SiC), and graphitic carbon were identified.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2009 |
| Autor(en): | Baake, O. ; Fainer, N. I. ; Hoffmann, P. S. ; Kosinova, M. L. ; Rumyantsev, Y. M. ; Trunova, V. A. ; Klein, Andreas ; Ensinger, W. ; Pollakowski, B. ; Beckhoff, B. ; Ulm, G. |
| Art des Eintrags: | Bibliographie |
| Titel: | Chemical characterization of SiCxNy nanolayers by FTIR-and Raman spectroscopy, XPS and TXRF-NEXAFS |
| Sprache: | Englisch |
| Publikationsjahr: | 11 Mai 2009 |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment |
| Jahrgang/Volume einer Zeitschrift: | 603 |
| (Heft-)Nummer: | 1-2 |
| DOI: | 10.1016/j.nima.2009.03.007 |
| URL / URN: | http://www.sciencedirect.com/science/article/B6TJM-4VT14C7-1... |
| Kurzbeschreibung (Abstract): | SiCxNy nanolayers were synthesized by a remote plasma enhanced chemical vapour deposition (RPECVD) method and chemically characterized by Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and near-edge X-ray absorption fine structure investigations in total reflection X-ray fluorescence geometry (TXRF-NEXAFS). The results are compared with those obtained for standard samples SiC and Si3N4 (and with spectra from the literature). As a first result, two or more compounds containing Si-N bonds (not Si3N4), one compound with a Si-C bond (not SiC), and graphitic carbon were identified. |
| Freie Schlagworte: | Chemical bonding, Silicon carbonitride, Thin film, TXRF-NEXAFS |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften |
| Hinterlegungsdatum: | 15 Jul 2009 12:50 |
| Letzte Änderung: | 25 Mär 2015 21:19 |
| PPN: | |
| Sponsoren: | This work was supported by RFBR Grant no. 07-03-91555-NNIO_a, and by the German Research Foundation (DFG) for the joint research project “Chemische und physikalische Charakterisierung von Nanoschichtsystemen”. |
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