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Chemical characterization of SiCxNy nanolayers by FTIR-and Raman spectroscopy, XPS and TXRF-NEXAFS

Baake, O. and Fainer, N. I. and Hoffmann, P. S. and Kosinova, M. L. and Rumyantsev, Y. M. and Trunova, V. A. and Klein, Andreas and Ensinger, W. and Pollakowski, B. and Beckhoff, B. and Ulm, G. (2009):
Chemical characterization of SiCxNy nanolayers by FTIR-and Raman spectroscopy, XPS and TXRF-NEXAFS.
In: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, pp. 174-177, 603, (1-2), ISSN 01689002,
[Online-Edition: http://www.sciencedirect.com/science/article/B6TJM-4VT14C7-1...],
[Article]

Abstract

SiCxNy nanolayers were synthesized by a remote plasma enhanced chemical vapour deposition (RPECVD) method and chemically characterized by Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and near-edge X-ray absorption fine structure investigations in total reflection X-ray fluorescence geometry (TXRF-NEXAFS). The results are compared with those obtained for standard samples SiC and Si3N4 (and with spectra from the literature). As a first result, two or more compounds containing Si-N bonds (not Si3N4), one compound with a Si-C bond (not SiC), and graphitic carbon were identified.

Item Type: Article
Erschienen: 2009
Creators: Baake, O. and Fainer, N. I. and Hoffmann, P. S. and Kosinova, M. L. and Rumyantsev, Y. M. and Trunova, V. A. and Klein, Andreas and Ensinger, W. and Pollakowski, B. and Beckhoff, B. and Ulm, G.
Title: Chemical characterization of SiCxNy nanolayers by FTIR-and Raman spectroscopy, XPS and TXRF-NEXAFS
Language: English
Abstract:

SiCxNy nanolayers were synthesized by a remote plasma enhanced chemical vapour deposition (RPECVD) method and chemically characterized by Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and near-edge X-ray absorption fine structure investigations in total reflection X-ray fluorescence geometry (TXRF-NEXAFS). The results are compared with those obtained for standard samples SiC and Si3N4 (and with spectra from the literature). As a first result, two or more compounds containing Si-N bonds (not Si3N4), one compound with a Si-C bond (not SiC), and graphitic carbon were identified.

Journal or Publication Title: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
Volume: 603
Number: 1-2
Uncontrolled Keywords: Chemical bonding, Silicon carbonitride, Thin film, TXRF-NEXAFS
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Material Analytics
11 Department of Materials and Earth Sciences > Material Science > Surface Science
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 15 Jul 2009 12:50
Official URL: http://www.sciencedirect.com/science/article/B6TJM-4VT14C7-1...
Identification Number: doi:10.1016/j.nima.2009.03.007
Funders: This work was supported by RFBR Grant no. 07-03-91555-NNIO_a, and by the German Research Foundation (DFG) for the joint research project “Chemische und physikalische Charakterisierung von Nanoschichtsystemen”.
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