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Damascene Metal Gate Technology: A Front-End CMP Based Universal Platform for High-k Evaluation at the Device Level

Endres, Ralf and Schwalke, Udo (2007):
Damascene Metal Gate Technology: A Front-End CMP Based Universal Platform for High-k Evaluation at the Device Level.
In: Proceedings of the International Conference on Planarization Technology 2007 (ICPT), pp. 421-426, [Online-Edition: http://elib1.ulb.tu-darmstadt.de/ieee/search/srchabstract.js...],
[Article]

Item Type: Article
Erschienen: 2007
Creators: Endres, Ralf and Schwalke, Udo
Title: Damascene Metal Gate Technology: A Front-End CMP Based Universal Platform for High-k Evaluation at the Device Level
Language: English
Journal or Publication Title: Proceedings of the International Conference on Planarization Technology 2007 (ICPT)
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Event Title: International Conference on Planarization Technology (ICPT)
Event Location: Dresden, Deutschland
Event Dates: 25.-26.10.2007
Date Deposited: 20 Nov 2008 08:28
Official URL: http://elib1.ulb.tu-darmstadt.de/ieee/search/srchabstract.js...
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