Wechsler, K. ; Rangelow, I. ; Borkowicz, Z. ; Durst, F. ; Kadinski, L. ; Schäfer, M. (1993)
Experimental and Numerical Study of the Effects of Neutral Transport and Chemical Kinetics on Plasma Etching System CF4/Si.
Conference or Workshop Item, Bibliographie
Item Type: | Conference or Workshop Item |
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Erschienen: | 1993 |
Creators: | Wechsler, K. ; Rangelow, I. ; Borkowicz, Z. ; Durst, F. ; Kadinski, L. ; Schäfer, M. |
Type of entry: | Bibliographie |
Title: | Experimental and Numerical Study of the Effects of Neutral Transport and Chemical Kinetics on Plasma Etching System CF4/Si |
Language: | English |
Date: | 1993 |
Book Title: | Proceedings of International Symposium on Plasma Etching |
Divisions: | 16 Department of Mechanical Engineering > Institute of Numerical Methods in Mechanical Engineering (FNB) 16 Department of Mechanical Engineering |
Date Deposited: | 24 Mar 2014 16:05 |
Last Modified: | 24 Mar 2014 16:05 |
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