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Composition and structure of SiCx:H Films Formed by Plasma Immersion Ion Implantation from a Methane Plasma

Volz, K. ; Klatt, Ch. ; Ensinger, Wolfgang (2000)
Composition and structure of SiCx:H Films Formed by Plasma Immersion Ion Implantation from a Methane Plasma.
In: Mat. Res. Soc. Symp. Proc. 609
Article, Bibliographie

Item Type: Article
Erschienen: 2000
Creators: Volz, K. ; Klatt, Ch. ; Ensinger, Wolfgang
Type of entry: Bibliographie
Title: Composition and structure of SiCx:H Films Formed by Plasma Immersion Ion Implantation from a Methane Plasma
Language: English
Date: 2000
Journal or Publication Title: Mat. Res. Soc. Symp. Proc. 609
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Material Analytics
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 25 Jun 2012 09:37
Last Modified: 05 Mar 2013 10:01
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