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Nanoscale structuring in confined geometries using atomic layer deposition: conformal coating and nanocavity formation

Ruff, Philip ; Carrillo-Solano, Mercedes ; Ulrich, Nils ; Hadley, Andrea ; Kluth, Patrick ; Toimil-Molares, Maria Eugenia ; Trautmann, Christina ; Hess, Christian (2018)
Nanoscale structuring in confined geometries using atomic layer deposition: conformal coating and nanocavity formation.
In: Zeitschrift für Physikalische Chemie, 232 (7-8)
doi: 10.1515/zpch-2017-1058
Article, Bibliographie

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Abstract

Nanoscale structuring in confined geometries using atomic layer deposition (ALD) is demonstrated for surfaces of nanochannels in track-etched polymer membranes and in mesoporous silica (SBA-15). Suitable process conditions for conformal ALD coating of polymer membranes and SBA-15 with inorganic oxides (SiO2, TiO2, Al2O3) were developed. On the basis of the oxide-coated layers, nanochannels were further structured by a molecular-templated ALD approach, where calixarene macromolecules are covalently attached to the surface and then embedded into an Al2O3 layer. The removal of calixarene by ozone treatment results in 1–2 nm wide surface nanocavities. Surfaces exposed to different process steps are analyzed by small angle X-ray scattering (SAXS) as well as by X-ray photoelectron and infrared spectroscopy. The proposed nanostructuring process increases the overall surface area, allows controlling the hydrophilicity of the channel surface, and is of interest for studying water and ion transport in confinement.

Item Type: Article
Erschienen: 2018
Creators: Ruff, Philip ; Carrillo-Solano, Mercedes ; Ulrich, Nils ; Hadley, Andrea ; Kluth, Patrick ; Toimil-Molares, Maria Eugenia ; Trautmann, Christina ; Hess, Christian
Type of entry: Bibliographie
Title: Nanoscale structuring in confined geometries using atomic layer deposition: conformal coating and nanocavity formation
Language: English
Date: 2018
Publisher: De Gruyter
Journal or Publication Title: Zeitschrift für Physikalische Chemie
Volume of the journal: 232
Issue Number: 7-8
DOI: 10.1515/zpch-2017-1058
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Abstract:

Nanoscale structuring in confined geometries using atomic layer deposition (ALD) is demonstrated for surfaces of nanochannels in track-etched polymer membranes and in mesoporous silica (SBA-15). Suitable process conditions for conformal ALD coating of polymer membranes and SBA-15 with inorganic oxides (SiO2, TiO2, Al2O3) were developed. On the basis of the oxide-coated layers, nanochannels were further structured by a molecular-templated ALD approach, where calixarene macromolecules are covalently attached to the surface and then embedded into an Al2O3 layer. The removal of calixarene by ozone treatment results in 1–2 nm wide surface nanocavities. Surfaces exposed to different process steps are analyzed by small angle X-ray scattering (SAXS) as well as by X-ray photoelectron and infrared spectroscopy. The proposed nanostructuring process increases the overall surface area, allows controlling the hydrophilicity of the channel surface, and is of interest for studying water and ion transport in confinement.

Uncontrolled Keywords: atomic layer deposition; confined geometry; hydrophilicity; mesoporous silica; nanocavity; nanoscale structuring; track-etched polymer membrane
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Ion-Beam-Modified Materials
07 Department of Chemistry
07 Department of Chemistry > Eduard Zintl-Institut
07 Department of Chemistry > Eduard Zintl-Institut > Physical Chemistry
Date Deposited: 15 Jun 2018 06:36
Last Modified: 24 Apr 2024 09:54
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