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Nanoscale structuring in confined geometries using atomic layer deposition: conformal coating and nanocavity formation

Ruff, Philip ; Carrillo-Solano, Mercedes ; Ulrich, Nils ; Hadley, Andrea ; Kluth, Patrick ; Toimil-Molares, Maria Eugenia ; Trautmann, Christina ; Hess, Christian (2018)
Nanoscale structuring in confined geometries using atomic layer deposition: conformal coating and nanocavity formation.
In: Zeitschrift für Physikalische Chemie, 232 (7-8)
doi: 10.1515/zpch-2017-1058
Artikel, Bibliographie

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Kurzbeschreibung (Abstract)

Nanoscale structuring in confined geometries using atomic layer deposition (ALD) is demonstrated for surfaces of nanochannels in track-etched polymer membranes and in mesoporous silica (SBA-15). Suitable process conditions for conformal ALD coating of polymer membranes and SBA-15 with inorganic oxides (SiO2, TiO2, Al2O3) were developed. On the basis of the oxide-coated layers, nanochannels were further structured by a molecular-templated ALD approach, where calixarene macromolecules are covalently attached to the surface and then embedded into an Al2O3 layer. The removal of calixarene by ozone treatment results in 1–2 nm wide surface nanocavities. Surfaces exposed to different process steps are analyzed by small angle X-ray scattering (SAXS) as well as by X-ray photoelectron and infrared spectroscopy. The proposed nanostructuring process increases the overall surface area, allows controlling the hydrophilicity of the channel surface, and is of interest for studying water and ion transport in confinement.

Typ des Eintrags: Artikel
Erschienen: 2018
Autor(en): Ruff, Philip ; Carrillo-Solano, Mercedes ; Ulrich, Nils ; Hadley, Andrea ; Kluth, Patrick ; Toimil-Molares, Maria Eugenia ; Trautmann, Christina ; Hess, Christian
Art des Eintrags: Bibliographie
Titel: Nanoscale structuring in confined geometries using atomic layer deposition: conformal coating and nanocavity formation
Sprache: Englisch
Publikationsjahr: 2018
Verlag: De Gruyter
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Zeitschrift für Physikalische Chemie
Jahrgang/Volume einer Zeitschrift: 232
(Heft-)Nummer: 7-8
DOI: 10.1515/zpch-2017-1058
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Kurzbeschreibung (Abstract):

Nanoscale structuring in confined geometries using atomic layer deposition (ALD) is demonstrated for surfaces of nanochannels in track-etched polymer membranes and in mesoporous silica (SBA-15). Suitable process conditions for conformal ALD coating of polymer membranes and SBA-15 with inorganic oxides (SiO2, TiO2, Al2O3) were developed. On the basis of the oxide-coated layers, nanochannels were further structured by a molecular-templated ALD approach, where calixarene macromolecules are covalently attached to the surface and then embedded into an Al2O3 layer. The removal of calixarene by ozone treatment results in 1–2 nm wide surface nanocavities. Surfaces exposed to different process steps are analyzed by small angle X-ray scattering (SAXS) as well as by X-ray photoelectron and infrared spectroscopy. The proposed nanostructuring process increases the overall surface area, allows controlling the hydrophilicity of the channel surface, and is of interest for studying water and ion transport in confinement.

Freie Schlagworte: atomic layer deposition; confined geometry; hydrophilicity; mesoporous silica; nanocavity; nanoscale structuring; track-etched polymer membrane
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Ionenstrahlmodifizierte Materialien
07 Fachbereich Chemie
07 Fachbereich Chemie > Eduard Zintl-Institut
07 Fachbereich Chemie > Eduard Zintl-Institut > Fachgebiet Physikalische Chemie
Hinterlegungsdatum: 15 Jun 2018 06:36
Letzte Änderung: 24 Apr 2024 09:54
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