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Klein, Sylke and Hahn, and Balogh, and Rück, and Baumann, and Michelmann, (1995):
Amorphisation of (100) oriented silicon by self implantation.
In: Institut für Kernphysik der J. W. Goethe Universität, Frankfurt/Main: Jahresbericht 1995, S. 45, [Article]

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