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Amorphisation of (100) oriented silicon by self implantation

Klein, Sylke and Hahn, and Balogh, and Rück, and Baumann, and Michelmann, (1995):
Amorphisation of (100) oriented silicon by self implantation.
In: Institut für Kernphysik der J. W. Goethe Universität, Frankfurt/Main: Jahresbericht 1995, S. 45, [Article]

Item Type: Article
Erschienen: 1995
Creators: Klein, Sylke and Hahn, and Balogh, and Rück, and Baumann, and Michelmann,
Title: Amorphisation of (100) oriented silicon by self implantation
Language: English
Journal or Publication Title: Institut für Kernphysik der J. W. Goethe Universität, Frankfurt/Main: Jahresbericht 1995, S. 45
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Department of Earth Sciences (1999 merged into Department of Materials and Earth Sciences)
Date Deposited: 19 Nov 2008 16:00
License: [undefiniert]
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