Klein, Sylke and Hahn, and Balogh, and Rück, and Baumann, and Michelmann, (1995):
Amorphisation of (100) oriented silicon by self implantation.
In: Institut für Kernphysik der J. W. Goethe Universität, Frankfurt/Main: Jahresbericht 1995, S. 45, [Article]
Item Type: | Article |
---|---|
Erschienen: | 1995 |
Creators: | Klein, Sylke and Hahn, and Balogh, and Rück, and Baumann, and Michelmann, |
Title: | Amorphisation of (100) oriented silicon by self implantation |
Language: | English |
Journal or Publication Title: | Institut für Kernphysik der J. W. Goethe Universität, Frankfurt/Main: Jahresbericht 1995, S. 45 |
Divisions: | 11 Department of Materials and Earth Sciences 11 Department of Materials and Earth Sciences > Department of Earth Sciences (1999 merged into Department of Materials and Earth Sciences) |
Date Deposited: | 19 Nov 2008 16:00 |
License: | [undefiniert] |
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Suche nach Titel in: | TUfind oder in Google |
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