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Riemenschneider, Rolf and Gottwald, and Hartnagel, (1995):
Characterisation of SiO2 deposition by low-temperature plasma and photo CVD using low-frequency noise measurements.
In: International Conference on Noise and 1/f Fluctuations: ICNF '95 <1995, Palanga, Litauen>: Proceedings. S. 599, [Conference or Workshop Item]

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