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Roodenko, K. and Gensch, M. and Rappich, J. and Hinrichs, K. and Esser, N. and Hunger, R. (2007):
Time-Resolved Synchrotron XPS Monitoring of Irradiation-Induced Nitrobenzene Reduction for Chemical Lithography.
In: The Journal of Physical Chemistry B, pp. 7541-7549, 111, (26), ISSN 1520-6106,
[Online-Edition: http://dx.doi.org/10.1021/jp072440j],
[Article]

Gensch, M. and Roodenko, K. and Hinrichs, K. and Hunger, R. and Güell, A. G. and Merson, A. and Schade, U. and Shapira, Y. and Dittrich, T. and Rappich, J. and Esser, N. (2005):
Molecule-solid interfaces studied with infrared ellipsometry : ultrathin nitrobenzene films.
In: Journal of Vacuum Science &Technology B, pp. 1838-1842, 23, [Article]

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