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Deuermeier, Jonas and Gassmann, Jürgen and Broetz, Joachim and Klein, Andreas (2011):
Reactive magnetron sputtering of Cu2O: Dependence on oxygen pressure and interface formation with indium tin oxide.
In: Journal of Applied Physics, p. 113704, 109, (11), ISSN 00218979,
[Online-Edition: http://dx.doi.org/10.1063/1.3592981],
[Article]
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