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Deuermeier, Jonas and Gassmann, Jürgen and Broetz, Joachim and Klein, Andreas (2011):
Reactive magnetron sputtering of Cu2O: Dependence on oxygen pressure and interface formation with indium tin oxide.
109, In: Journal of Applied Physics, (11), p. 113704, ISSN 00218979, [Online-Edition: http://dx.doi.org/10.1063/1.3592981],
[Article]

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