Flege, S. ; Hatada, R. ; Derepa, A. ; Dietz, C. ; Ensinger, W. ; Baba, K. (2017)
Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition.
In: Review of Scientific Instruments, 88 (9)
doi: 10.1063/1.4995080
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
A sample holder with a large open area offers several benefits when used in the process of plasma immersion ion implantation and deposition in which the plasma is generated by a high voltage applied to the sample holder: The ignition voltage of the plasma is lower, and the deposition rate can be several times higher than in the case of a normal plate-like holder. There is a more pronounced edge effect regarding the film thickness. Other film properties are also affected; for diamond-like carbon films, the film structure exhibits more disorder. The hardness of the samples is similar, with the surfaces of the samples being very smooth.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2017 |
| Autor(en): | Flege, S. ; Hatada, R. ; Derepa, A. ; Dietz, C. ; Ensinger, W. ; Baba, K. |
| Art des Eintrags: | Bibliographie |
| Titel: | Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition |
| Sprache: | Englisch |
| Publikationsjahr: | September 2017 |
| Verlag: | AIP Publications |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Review of Scientific Instruments |
| Jahrgang/Volume einer Zeitschrift: | 88 |
| (Heft-)Nummer: | 9 |
| DOI: | 10.1063/1.4995080 |
| URL / URN: | https://doi.org/10.1063/1.4995080 |
| Kurzbeschreibung (Abstract): | A sample holder with a large open area offers several benefits when used in the process of plasma immersion ion implantation and deposition in which the plasma is generated by a high voltage applied to the sample holder: The ignition voltage of the plasma is lower, and the deposition rate can be several times higher than in the case of a normal plate-like holder. There is a more pronounced edge effect regarding the film thickness. Other film properties are also affected; for diamond-like carbon films, the film structure exhibits more disorder. The hardness of the samples is similar, with the surfaces of the samples being very smooth. |
| Freie Schlagworte: | Etching, Thin films, Analytical chemistry, Carbon based materials, Ceramics |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Physics of Surfaces |
| Hinterlegungsdatum: | 28 Dez 2017 12:03 |
| Letzte Änderung: | 08 Jan 2018 06:48 |
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