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Nanoparticles as a Metal Source in Plasma Processes

Flege, Stefan ; Hatada, Ruriko ; Jantsen, Gennadi ; Walbert, Torsten ; Ensinger, Wolfgang ; Baba, Koumei ; Morimura, Takao ; Muench, Falk :
Nanoparticles as a Metal Source in Plasma Processes.
[Online-Edition: https://doi.org/10.14723/tmrsj.42.31]
In: Transactions of the Materials Research Society of Japan, 42 (2) pp. 31-36. ISSN 1382-3469
[Artikel], (2017)

Offizielle URL: https://doi.org/10.14723/tmrsj.42.31

Kurzbeschreibung (Abstract)

When a metal is added to a layer of diamond-like carbon (DLC), the resulting particle size of the metal within the film usually depends on the metal content. To be more flexible in influencing the size of the particles that result when using a plasma based preparation process two different approaches were tested: on the one hand the combination of a gaseous precursor with magnetron sputtering, where a nanostructured coating is applied on top of the sputter target in advance; on the other hand, the addition of preformed metallic nanoparticles to a liquid. In both cases, the nanoparticles or -structures were prepared by a wet chemical process, whereas the DLC layer was prepared by a plasma process. The produced metal-containing DLC films were characterized regarding their metal content and distribution as well as regarding possible contaminations from the chemical preparation process.

Typ des Eintrags: Artikel
Erschienen: 2017
Autor(en): Flege, Stefan ; Hatada, Ruriko ; Jantsen, Gennadi ; Walbert, Torsten ; Ensinger, Wolfgang ; Baba, Koumei ; Morimura, Takao ; Muench, Falk
Titel: Nanoparticles as a Metal Source in Plasma Processes
Sprache: Englisch
Kurzbeschreibung (Abstract):

When a metal is added to a layer of diamond-like carbon (DLC), the resulting particle size of the metal within the film usually depends on the metal content. To be more flexible in influencing the size of the particles that result when using a plasma based preparation process two different approaches were tested: on the one hand the combination of a gaseous precursor with magnetron sputtering, where a nanostructured coating is applied on top of the sputter target in advance; on the other hand, the addition of preformed metallic nanoparticles to a liquid. In both cases, the nanoparticles or -structures were prepared by a wet chemical process, whereas the DLC layer was prepared by a plasma process. The produced metal-containing DLC films were characterized regarding their metal content and distribution as well as regarding possible contaminations from the chemical preparation process.

Titel der Zeitschrift, Zeitung oder Schriftenreihe: Transactions of the Materials Research Society of Japan
Band: 42
(Heft-)Nummer: 2
Freie Schlagworte: nanoparticles, plasma, metal, diamond-like carbon
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik
Hinterlegungsdatum: 21 Jul 2017 08:51
Offizielle URL: https://doi.org/10.14723/tmrsj.42.31
ID-Nummer: doi:10.14723/tmrsj.42.31
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