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Damscene Metal Gate Technology: A Solution to High-K Gate Stack Challenges?

Schwalke, Udo (2009):
Damscene Metal Gate Technology: A Solution to High-K Gate Stack Challenges?
In: DGM Arbeitskreis "Materialien für elektronische Anwendungen", 20.02.2009, Berlin, Deutschland, [Conference or Workshop Item]

Item Type: Conference or Workshop Item
Erschienen: 2009
Creators: Schwalke, Udo
Title: Damscene Metal Gate Technology: A Solution to High-K Gate Stack Challenges?
Language: English
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Event Title: DGM Arbeitskreis "Materialien für elektronische Anwendungen"
Event Location: 20.02.2009
Event Dates: Berlin, Deutschland
Date Deposited: 29 Jun 2011 09:34
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