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Room-temperature growth of ZrO2 thin films using a novel hyperthermal oxygen-atom source

Wisotzki, E. and Balogh, Adam G. and Hahn, H. and Wolan, J. T. and Hoflund, G. B. (1999):
Room-temperature growth of ZrO2 thin films using a novel hyperthermal oxygen-atom source.
In: Journal of Vacuum Science and Technology A, (1), 17. American Vacuum Society (AVS), pp. 14-18, ISSN 0734-2101, e-ISSN 1520-8559,
DOI: 10.1116/1.581547,
[Article]

Item Type: Article
Erschienen: 1999
Creators: Wisotzki, E. and Balogh, Adam G. and Hahn, H. and Wolan, J. T. and Hoflund, G. B.
Title: Room-temperature growth of ZrO2 thin films using a novel hyperthermal oxygen-atom source
Language: English
Journal or Publication Title: Journal of Vacuum Science and Technology A
Journal volume: 17
Number: 1
Publisher: American Vacuum Society (AVS)
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Material Analytics
Date Deposited: 14 Jun 2011 14:06
DOI: 10.1116/1.581547
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