Schwalke, Udo (2005):
Gate Dielectrics: Process Integration Issues and Electrical Properties.
In: Journal of Telecommunications and Technology, 1, p. 7. [Article]
| Item Type: | Article |
|---|---|
| Erschienen: | 2005 |
| Creators: | Schwalke, Udo |
| Title: | Gate Dielectrics: Process Integration Issues and Electrical Properties |
| Language: | English |
| Journal or Publication Title: | Journal of Telecommunications and Technology |
| Journal volume: | 1 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 20 Nov 2008 08:22 |
| License: | [undefiniert] |
| Export: | |
| Suche nach Titel in: | TUfind oder in Google |
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