Schwalke, Udo (2005):
Gate Dielectrics: Process Integration Issues and Electrical Properties.
In: Journal of Telecommunications and Technology, 1, p. 7. [Article]
Item Type: | Article |
---|---|
Erschienen: | 2005 |
Creators: | Schwalke, Udo |
Title: | Gate Dielectrics: Process Integration Issues and Electrical Properties |
Language: | English |
Journal or Publication Title: | Journal of Telecommunications and Technology |
Journal volume: | 1 |
Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
Date Deposited: | 20 Nov 2008 08:22 |
License: | [undefiniert] |
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Suche nach Titel in: | TUfind oder in Google |
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