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Gate Dielectrics: Process Integration Issues and Electrical Properties

Schwalke, Udo (2005):
Gate Dielectrics: Process Integration Issues and Electrical Properties.
In: Journal of Telecommunications and Technology, 1, p. 7. [Article]

Item Type: Article
Erschienen: 2005
Creators: Schwalke, Udo
Title: Gate Dielectrics: Process Integration Issues and Electrical Properties
Language: English
Journal or Publication Title: Journal of Telecommunications and Technology
Journal volume: 1
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Date Deposited: 20 Nov 2008 08:22
License: [undefiniert]
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