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X-ray Raman scattering at the Si L II,III-edge of bulk amorphous SiO

Sternemann, C. and Soininen, J. A. and Volmer, M. and Hohl, Achim and Vankó, G. and Streit, S. and Tolan, M. (2005):
X-ray Raman scattering at the Si L II,III-edge of bulk amorphous SiO.
In: Journal of physics and chemistry of solids, 66. pp. 2277-2280, [Article]

Item Type: Article
Erschienen: 2005
Creators: Sternemann, C. and Soininen, J. A. and Volmer, M. and Hohl, Achim and Vankó, G. and Streit, S. and Tolan, M.
Title: X-ray Raman scattering at the Si L II,III-edge of bulk amorphous SiO
Language: English
Journal or Publication Title: Journal of physics and chemistry of solids
Journal volume: 66
Divisions: 11 Department of Materials and Earth Sciences
Date Deposited: 20 Nov 2008 08:21
Additional Information:

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