Schäfer, N. ; Karabas, N. ; Palakkal, J. P. ; Petzold, S. ; Major, M. ; Pietralla, N. ; Alff, L. (2020)
Kinetically induced low-temperature synthesis of Nb3Sn thin films.
In: Journal of Applied Physics, 128 (13)
doi: 10.1063/5.0015376
Artikel, Bibliographie
Dies ist die neueste Version dieses Eintrags.
Kurzbeschreibung (Abstract)
Nb3Sn thin films are promising candidates for future application in superconducting radio frequency cavities due to their low surface resistivity, high critical temperature, and critical field, as compared to bulk niobium, which is the current state of the art. In this paper, we report the deposition of Nb3Sn thin films by magnetron co-sputtering at the extremely low temperature of 435 degrees C. These thin films show a critical temperature of 16.3 K, a high critical current density of 1.60 x 10(5) A/cm(2), and a strong shielding effect. The key to achieving low-temperature growth is the independent kinetic control of Nb and Sn species in the sputtering process. From a technological viewpoint, the low-temperature approach paves the way for the use of Nb3Sn as a coating in cryogenic efficient copper based cavities, thereby avoiding the detrimental interdiffusion of Cu.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2020 |
| Autor(en): | Schäfer, N. ; Karabas, N. ; Palakkal, J. P. ; Petzold, S. ; Major, M. ; Pietralla, N. ; Alff, L. |
| Art des Eintrags: | Bibliographie |
| Titel: | Kinetically induced low-temperature synthesis of Nb3Sn thin films |
| Sprache: | Englisch |
| Publikationsjahr: | 7 Oktober 2020 |
| Verlag: | American Institute of Physics |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Journal of Applied Physics |
| Jahrgang/Volume einer Zeitschrift: | 128 |
| (Heft-)Nummer: | 13 |
| DOI: | 10.1063/5.0015376 |
| URL / URN: | https://aip.scitation.org/doi/10.1063/5.0015376 |
| Zugehörige Links: | |
| Kurzbeschreibung (Abstract): | Nb3Sn thin films are promising candidates for future application in superconducting radio frequency cavities due to their low surface resistivity, high critical temperature, and critical field, as compared to bulk niobium, which is the current state of the art. In this paper, we report the deposition of Nb3Sn thin films by magnetron co-sputtering at the extremely low temperature of 435 degrees C. These thin films show a critical temperature of 16.3 K, a high critical current density of 1.60 x 10(5) A/cm(2), and a strong shielding effect. The key to achieving low-temperature growth is the independent kinetic control of Nb and Sn species in the sputtering process. From a technological viewpoint, the low-temperature approach paves the way for the use of Nb3Sn as a coating in cryogenic efficient copper based cavities, thereby avoiding the detrimental interdiffusion of Cu. |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Dünne Schichten |
| Hinterlegungsdatum: | 20 Nov 2020 11:51 |
| Letzte Änderung: | 03 Jul 2024 02:48 |
| PPN: | |
| Projekte: | This work was supported by the German Federal Ministry of Education and Research (BMBF) through Grant No. 05H18RDRB2 and the German Research Foundation (DFG) through GRK 2128. |
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| Suche nach Titel in: | TUfind oder in Google |
Verfügbare Versionen dieses Eintrags
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Kinetically induced low-temperature synthesis of Nb₃Sn thin films. (deposited 31 Aug 2021 12:12)
- Kinetically induced low-temperature synthesis of Nb3Sn thin films. (deposited 20 Nov 2020 11:51) [Gegenwärtig angezeigt]
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