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Kinetically induced low-temperature synthesis of Nb₃Sn thin films

Schäfer, Nils ; Karabas, Nail ; Palakkal, Jasnamol Pezhumkattil ; Petzold, Stefan ; Major, Marton ; Pietralla, Norbert ; Alff, Lambert (2021):
Kinetically induced low-temperature synthesis of Nb₃Sn thin films. (Publisher's Version)
In: Journal of Applied Physics, 128 (13), AIP Publishing, ISSN 0021-8979, e-ISSN 1089-7550,
DOI: 10.26083/tuprints-00019408,
[Article]

Abstract

Nb₃Sn thin films are promising candidates for future application in superconducting radio frequency cavities due to their low surface resistivity, high critical temperature, and critical field, as compared to bulk niobium, which is the current state of the art. In this paper, we report the deposition of Nb₃Sn thin films by magnetron co-sputtering at the extremely low temperature of 435°C. These thin films show a critical temperature of 16.3 K, a high critical current density of 1.60×10⁵A/cm², and a strong shielding effect. The key to achieving low-temperature growth is the independent kinetic control of Nb and Sn species in the sputtering process. From a technological viewpoint, the low-temperature approach paves the way for the use of Nb₃Sn as a coating in cryogenic efficient copper based cavities, thereby avoiding the detrimental interdiffusion of Cu.

Item Type: Article
Erschienen: 2021
Creators: Schäfer, Nils ; Karabas, Nail ; Palakkal, Jasnamol Pezhumkattil ; Petzold, Stefan ; Major, Marton ; Pietralla, Norbert ; Alff, Lambert
Origin: Secondary publication service
Status: Publisher's Version
Title: Kinetically induced low-temperature synthesis of Nb₃Sn thin films
Language: English
Abstract:

Nb₃Sn thin films are promising candidates for future application in superconducting radio frequency cavities due to their low surface resistivity, high critical temperature, and critical field, as compared to bulk niobium, which is the current state of the art. In this paper, we report the deposition of Nb₃Sn thin films by magnetron co-sputtering at the extremely low temperature of 435°C. These thin films show a critical temperature of 16.3 K, a high critical current density of 1.60×10⁵A/cm², and a strong shielding effect. The key to achieving low-temperature growth is the independent kinetic control of Nb and Sn species in the sputtering process. From a technological viewpoint, the low-temperature approach paves the way for the use of Nb₃Sn as a coating in cryogenic efficient copper based cavities, thereby avoiding the detrimental interdiffusion of Cu.

Journal or Publication Title: Journal of Applied Physics
Journal volume: 128
Number: 13
Publisher: AIP Publishing
Collation: 7 Seiten
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Advanced Thin Film Technology
Date Deposited: 31 Aug 2021 12:12
DOI: 10.26083/tuprints-00019408
Official URL: https://tuprints.ulb.tu-darmstadt.de/19408
URN: urn:nbn:de:tuda-tuprints-194083
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