Neelisetty, Krishna Kanth and Mu, Xiaoke and Gutsch, Sebastian and Vahl, Alexander and Molinari, Alan and von Seggern, Falk and Hansen, Mirko and Scherer, Torsten and Zacharias, Margit and Kienle, Lorenz and Chakravadhanula, V. S. Kiran and Kübel, Christian (2019):
Electron Beam Effects on Oxide Thin Films—Structure and Electrical Property Correlations.
In: Microscopy and Microanalysis, 25 (3), pp. 592-600. Cambridge University Press, ISSN 1431-9276,
DOI: 10.1017/S1431927619000175,
[Article]
Official URL: https://doi.org/10.1017/S1431927619000175
| Item Type: | Article |
|---|---|
| Erschienen: | 2019 |
| Creators: | Neelisetty, Krishna Kanth and Mu, Xiaoke and Gutsch, Sebastian and Vahl, Alexander and Molinari, Alan and von Seggern, Falk and Hansen, Mirko and Scherer, Torsten and Zacharias, Margit and Kienle, Lorenz and Chakravadhanula, V. S. Kiran and Kübel, Christian |
| Title: | Electron Beam Effects on Oxide Thin Films—Structure and Electrical Property Correlations |
| Language: | English |
| Journal or Publication Title: | Microscopy and Microanalysis |
| Journal volume: | 25 |
| Number: | 3 |
| Publisher: | Cambridge University Press |
| Divisions: | 11 Department of Materials and Earth Sciences 11 Department of Materials and Earth Sciences > Material Science 11 Department of Materials and Earth Sciences > Material Science > In-situ electron microscopy |
| Date Deposited: | 29 May 2020 08:15 |
| DOI: | 10.1017/S1431927619000175 |
| Official URL: | https://doi.org/10.1017/S1431927619000175 |
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| Suche nach Titel in: | TUfind oder in Google |
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