Neelisetty, Krishna Kanth ; Mu, Xiaoke ; Gutsch, Sebastian ; Vahl, Alexander ; Molinari, Alan ; Seggern, Falk von ; Hansen, Mirko ; Scherer, Torsten ; Zacharias, Margit ; Kienle, Lorenz ; Chakravadhanula, V. S. Kiran ; Kübel, Christian (2019):
Electron Beam Effects on Oxide Thin Films—Structure and Electrical Property Correlations.
In: Microscopy and Microanalysis, 25 (3), pp. 592-600. Cambridge University Press, ISSN 1431-9276,
DOI: 10.1017/S1431927619000175,
[Article]
Official URL: https://doi.org/10.1017/S1431927619000175
| Item Type: | Article |
|---|---|
| Erschienen: | 2019 |
| Creators: | Neelisetty, Krishna Kanth ; Mu, Xiaoke ; Gutsch, Sebastian ; Vahl, Alexander ; Molinari, Alan ; Seggern, Falk von ; Hansen, Mirko ; Scherer, Torsten ; Zacharias, Margit ; Kienle, Lorenz ; Chakravadhanula, V. S. Kiran ; Kübel, Christian |
| Title: | Electron Beam Effects on Oxide Thin Films—Structure and Electrical Property Correlations |
| Language: | English |
| Journal or Publication Title: | Microscopy and Microanalysis |
| Journal volume: | 25 |
| Number: | 3 |
| Publisher: | Cambridge University Press |
| Divisions: | 11 Department of Materials and Earth Sciences 11 Department of Materials and Earth Sciences > Material Science 11 Department of Materials and Earth Sciences > Material Science > In-situ electron microscopy |
| Date Deposited: | 29 May 2020 08:15 |
| DOI: | 10.1017/S1431927619000175 |
| Official URL: | https://doi.org/10.1017/S1431927619000175 |
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