Ruff, Philip ; Carrillo-Solano, Mercedes ; Ulrich, Nils ; Hadley, Andrea ; Kluth, Patrick ; Toimil-Molares, Maria Eugenia ; Trautmann, Christina ; Hess, Christian (2018)
Nanoscale structuring in confined geometries using atomic layer deposition: conformal coating and nanocavity formation.
In: Zeitschrift für Physikalische Chemie, 232 (7-8)
doi: 10.1515/zpch-2017-1058
Artikel, Bibliographie
Dies ist die neueste Version dieses Eintrags.
Kurzbeschreibung (Abstract)
Nanoscale structuring in confined geometries using atomic layer deposition (ALD) is demonstrated for surfaces of nanochannels in track-etched polymer membranes and in mesoporous silica (SBA-15). Suitable process conditions for conformal ALD coating of polymer membranes and SBA-15 with inorganic oxides (SiO2, TiO2, Al2O3) were developed. On the basis of the oxide-coated layers, nanochannels were further structured by a molecular-templated ALD approach, where calixarene macromolecules are covalently attached to the surface and then embedded into an Al2O3 layer. The removal of calixarene by ozone treatment results in 1–2 nm wide surface nanocavities. Surfaces exposed to different process steps are analyzed by small angle X-ray scattering (SAXS) as well as by X-ray photoelectron and infrared spectroscopy. The proposed nanostructuring process increases the overall surface area, allows controlling the hydrophilicity of the channel surface, and is of interest for studying water and ion transport in confinement.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2018 |
| Autor(en): | Ruff, Philip ; Carrillo-Solano, Mercedes ; Ulrich, Nils ; Hadley, Andrea ; Kluth, Patrick ; Toimil-Molares, Maria Eugenia ; Trautmann, Christina ; Hess, Christian |
| Art des Eintrags: | Bibliographie |
| Titel: | Nanoscale structuring in confined geometries using atomic layer deposition: conformal coating and nanocavity formation |
| Sprache: | Englisch |
| Publikationsjahr: | 2018 |
| Verlag: | De Gruyter |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Zeitschrift für Physikalische Chemie |
| Jahrgang/Volume einer Zeitschrift: | 232 |
| (Heft-)Nummer: | 7-8 |
| DOI: | 10.1515/zpch-2017-1058 |
| Zugehörige Links: | |
| Kurzbeschreibung (Abstract): | Nanoscale structuring in confined geometries using atomic layer deposition (ALD) is demonstrated for surfaces of nanochannels in track-etched polymer membranes and in mesoporous silica (SBA-15). Suitable process conditions for conformal ALD coating of polymer membranes and SBA-15 with inorganic oxides (SiO2, TiO2, Al2O3) were developed. On the basis of the oxide-coated layers, nanochannels were further structured by a molecular-templated ALD approach, where calixarene macromolecules are covalently attached to the surface and then embedded into an Al2O3 layer. The removal of calixarene by ozone treatment results in 1–2 nm wide surface nanocavities. Surfaces exposed to different process steps are analyzed by small angle X-ray scattering (SAXS) as well as by X-ray photoelectron and infrared spectroscopy. The proposed nanostructuring process increases the overall surface area, allows controlling the hydrophilicity of the channel surface, and is of interest for studying water and ion transport in confinement. |
| Freie Schlagworte: | atomic layer deposition; confined geometry; hydrophilicity; mesoporous silica; nanocavity; nanoscale structuring; track-etched polymer membrane |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Ionenstrahlmodifizierte Materialien 07 Fachbereich Chemie 07 Fachbereich Chemie > Eduard Zintl-Institut 07 Fachbereich Chemie > Eduard Zintl-Institut > Fachgebiet Physikalische Chemie |
| Hinterlegungsdatum: | 15 Jun 2018 06:36 |
| Letzte Änderung: | 24 Apr 2024 09:54 |
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| Suche nach Titel in: | TUfind oder in Google |
Verfügbare Versionen dieses Eintrags
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Nanoscale Structuring in Confined Geometries using Atomic Layer Deposition: Conformal Coating and Nanocavity Formation. (deposited 23 Apr 2024 08:12)
- Nanoscale structuring in confined geometries using atomic layer deposition: conformal coating and nanocavity formation. (deposited 15 Jun 2018 06:36) [Gegenwärtig angezeigt]
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