Hillmann, Stephan ; Rachut, Karsten ; Bayer, Thorsten J. M. ; Li, Shunyi ; Klein, Andreas (2015)
Application of atomic layer deposited Al2O3as charge injection layer for high-permittivity dielectrics.
In: Semiconductor Science and Technology, 30 (2)
doi: 10.1088/0268-1242/30/2/024012
Article, Bibliographie