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Hillmann, Stephan and Rachut, Karsten and Bayer, Thorsten J. M. and Li, Shunyi and Klein, Andreas (2015):
Application of atomic layer deposited Al2O3as charge injection layer for high-permittivity dielectrics.
In: Semiconductor Science and Technology, 30 (2), pp. 024012(1-7). ISSN 0268-1242,
[Article]

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