TU Darmstadt / ULB / TUbiblio

Browse by Person

Up a level
Export as [feed] Atom [feed] RSS 1.0 [feed] RSS 2.0
Group by: No Grouping | Item Type | Date | Language
Number of items: 1.

Hillmann, Stephan and Rachut, Karsten and Bayer, Thorsten J. M. and Li, Shunyi and Klein, Andreas (2015):
Application of atomic layer deposited Al2O3as charge injection layer for high-permittivity dielectrics.
In: Semiconductor Science and Technology, pp. 024012(1-7), 30, (2), ISSN 0268-1242,
[Online-Edition: http://dx.doi.org/10.1088/0268-1242/30/2/024012],
[Article]

This list was generated on Tue Jun 18 00:33:33 2019 CEST.