Deuermeier, Jonas ; Fortunato, Elvira ; Martins, Rodrigo ; Klein, Andreas (2021):
Energy band alignment at the nanoscale. (Publisher's Version)
In: Applied Physics Letters, 110 (5), AIP Publishing, ISSN 0003-6951, e-ISSN 1077-3118,
DOI: 10.26083/tuprints-00019852,
[Article]

Deuermeier, Jonas ; Wardenga, Hans F. ; Morasch, Jan ; Siol, Sebastian ; Nandy, Suman ; Calmeiro, Tomás ; Martins, Rodrigo ; Klein, Andreas ; Fortunato, Elvira (2021):
Highly conductive grain boundaries in copper oxide thin films. (Publisher's Version)
In: Journal of Applied Physics, 119 (23), AIP Publishing, ISSN 0021-8979, e-ISSN 1089-7550,
DOI: 10.26083/tuprints-00019920,
[Article]

Deuermeier, Jonas ; Kiazadeh, Asal ; Klein, Andreas ; Martins, Rodrigo ; Fortunato, Elvira (2021):
Multi-Level Cell Properties of a Bilayer Cu₂O/Al₂O₃ Resistive Switching Device. (Publisher's Version)
In: Nanomaterials, 9 (2), MDPI, e-ISSN 2079-4991,
DOI: 10.26083/tuprints-00019794,
[Article]

Deuermeier, Jonas ; Kiazadeh, Asal ; Klein, Andreas ; Martins, Rodrigo ; Fortunato, Elvira (2019):
Multi-Level Cell Properties of a Bilayer Cu2O/Al2O3 Resistive Switching Device.
In: Nanomaterials, 9 (2), p. 289. MDPI, ISSN 2079-4991,
DOI: 10.3390/nano9020289,
[Article]

Deuermeier, Jonas ; Fortunato, Elvira ; Martins, Rodrigo ; Klein, Andreas (2017):
Energy band alignment at the nanoscale.
In: Applied Physics Letters, 110 (5), pp. 051603. American Institute of Physics, ISSN 00036951,
[Article]

Deuermeier, Jonas ; Wardenga, Hans F. ; Morasch, Jan ; Siol, Sebastian ; Nandy, Suman ; Calmeiro, Tomás ; Martins, Rodrigo ; Klein, Andreas ; Fortunato, Elvira (2016):
Highly conductive grain boundaries in copper oxide thin films.
In: Journal of Applied Physics, 119 (23), p. 235303. ISSN 0021-8979,
[Article]

Deuermeier, Jonas ; Bayer, Thorsten J. M. ; Yanagi, Hiroshi ; Kiazadeh, Asal ; Martins, Rodrigo ; Klein, Andreas ; Fortunato, Elvira (2016):
Substrate reactivity as the origin of Fermi level pinning at the Cu2O/ALD-Al2O3interface.
In: Materials Research Express, 3 (4), pp. 046404. ISSN 2053-1591,
[Article]