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Polarization of parametric x radiation

Morokhovskii, Victor V. ; Schmidt, K. H. ; Buschhorn, G. ; Freudenberger, J. ; Genz, H. ; Kotthaus, R. ; Richter, A. ; Rzepka, M. ; Weinmann, P. M. (1997):
Polarization of parametric x radiation.
In: Physical Review Letters, 79 (22), pp. 4389-4392. APS Physics, ISSN 0031-9007,
DOI: 10.1103/PhysRevLett.79.4389,
[Article]

Abstract

Polarization properties of parametric x radiation (PXR) produced by E0=80.5MeV electrons interacting with a 13μm thick silicon crystal have been investigated. The direction and the degree of the linear polarization of PXR observed at about 20° with respect to the electron beam direction were determined by means of a novel method exploiting directional information of the photoelectric effect in a charge coupled device consisting of 6.8×6.8μm pixels. Comparison of the results with a newly derived theoretical expression exhibits very good agreement if on top of the basic interaction process underlying PXR effects decreasing the polarization are taken into account.

Item Type: Article
Erschienen: 1997
Creators: Morokhovskii, Victor V. ; Schmidt, K. H. ; Buschhorn, G. ; Freudenberger, J. ; Genz, H. ; Kotthaus, R. ; Richter, A. ; Rzepka, M. ; Weinmann, P. M.
Title: Polarization of parametric x radiation
Language: English
Abstract:

Polarization properties of parametric x radiation (PXR) produced by E0=80.5MeV electrons interacting with a 13μm thick silicon crystal have been investigated. The direction and the degree of the linear polarization of PXR observed at about 20° with respect to the electron beam direction were determined by means of a novel method exploiting directional information of the photoelectric effect in a charge coupled device consisting of 6.8×6.8μm pixels. Comparison of the results with a newly derived theoretical expression exhibits very good agreement if on top of the basic interaction process underlying PXR effects decreasing the polarization are taken into account.

Journal or Publication Title: Physical Review Letters
Volume of the journal: 79
Issue Number: 22
Publisher: APS Physics
Divisions: 05 Department of Physics
Date Deposited: 19 Nov 2008 15:57
DOI: 10.1103/PhysRevLett.79.4389
Additional Information:

Ersch. ebenf. als: Techn. Univ. Darmstadt, FB 5, Inst. für Kernphysik: IKDA; 97/28

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