Fingerle, Mathias ; Tengeler, Sven ; Calvet, Wolfram ; Mayer, Thomas ; Jaegermann, Wolfram (2018)
Water Interaction with Sputter-Deposited Nickel Oxide on n-Si Photoanode: Cryo Photoelectron Spectroscopy on Adsorbed Water in the Frozen Electrolyte Approach.
In: Journal of The Electrochemical Society, 165 (4)
doi: 10.1149/2.0191804jes
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
The interaction of water with a magnetron-sputtered nickel oxide thin film on an n-type silicon photoanode is investigated in perspective to oxygen evolution. The substrate was exposed in-situ stepwise to gas phase water up to 10 L at liquid N2 temperature and analyzed via X-ray and UV photoelectron spectroscopy in the so called frozen electrolyte approach. Photoemission of the pristine NiOx layer shows the presence of stoichiometric NiO and Ni2O3 as well as of non-stoichiometric phases. In the monolayer range, molecular and dissociative adsorption is detected assigned to the NiO respective Ni2O3 phase. Initially, the emission of the molecular adsorbed water species interacting with NiO is found at 0.8 eV lower binding energies as compared to water related emission for higher coverages with binding energies commonly assigned to H2O-H2O interaction. In addition to the chemical analysis, the electronic structure of the n-Si/SiOx/NiOx/H2O photoanode is measured and discussed.
Typ des Eintrags: | Artikel |
---|---|
Erschienen: | 2018 |
Autor(en): | Fingerle, Mathias ; Tengeler, Sven ; Calvet, Wolfram ; Mayer, Thomas ; Jaegermann, Wolfram |
Art des Eintrags: | Bibliographie |
Titel: | Water Interaction with Sputter-Deposited Nickel Oxide on n-Si Photoanode: Cryo Photoelectron Spectroscopy on Adsorbed Water in the Frozen Electrolyte Approach |
Sprache: | Englisch |
Publikationsjahr: | 2 Februar 2018 |
Verlag: | Electrochemical Society Publishing |
Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Journal of The Electrochemical Society |
Jahrgang/Volume einer Zeitschrift: | 165 |
(Heft-)Nummer: | 4 |
DOI: | 10.1149/2.0191804jes |
URL / URN: | https://doi.org/10.1149/2.0191804jes |
Kurzbeschreibung (Abstract): | The interaction of water with a magnetron-sputtered nickel oxide thin film on an n-type silicon photoanode is investigated in perspective to oxygen evolution. The substrate was exposed in-situ stepwise to gas phase water up to 10 L at liquid N2 temperature and analyzed via X-ray and UV photoelectron spectroscopy in the so called frozen electrolyte approach. Photoemission of the pristine NiOx layer shows the presence of stoichiometric NiO and Ni2O3 as well as of non-stoichiometric phases. In the monolayer range, molecular and dissociative adsorption is detected assigned to the NiO respective Ni2O3 phase. Initially, the emission of the molecular adsorbed water species interacting with NiO is found at 0.8 eV lower binding energies as compared to water related emission for higher coverages with binding energies commonly assigned to H2O-H2O interaction. In addition to the chemical analysis, the electronic structure of the n-Si/SiOx/NiOx/H2O photoanode is measured and discussed. |
Freie Schlagworte: | nickel oxide, photocatalysis, photoemission |
Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung |
Hinterlegungsdatum: | 22 Feb 2018 13:34 |
Letzte Änderung: | 26 Jun 2018 10:49 |
PPN: | |
Sponsoren: | Financial support through the project “fundamentals of electro-chemical phase boundaries at semiconductor/electrolyte interfaces” GEP-HE funded by the German Federal Ministry of Education and Research BMBF under contract 13XP5023A is gratefully acknowled., Financial support by the European Union under the a-leaf project (732840-A-LEAF) is gratefully acknowledged.nancial support |
Export: | |
Suche nach Titel in: | TUfind oder in Google |
Frage zum Eintrag |
Optionen (nur für Redakteure)
Redaktionelle Details anzeigen |