Flege, Stefan ; Hatada, Ruriko ; Hanauer, Andreas ; Ensinger, Wolfgang ; Morimura, Takao ; Baba, Koumei (2017)
Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties.
In: Advances in Materials Science and Engineering, 2017
doi: 10.1155/2017/9082164
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
Metal-containing diamond-like carbon (Me-DLC) films were prepared by a combination of plasma source ion implantation (PSII) and reactive magnetron sputtering. Two metals were used that differ in their tendency to form carbide and possess a different sputter yield, that is, Cu with a relatively high sputter yield and Ti with a comparatively low one. The DLC film preparation was based on the hydrocarbon gas ethylene (C2H4). The preparation technique is described and the parameters influencing the metal content within the film are discussed. Film properties that are changed by the metal addition, such as structure, electrical resistivity, and friction coefficient, were evaluated and compared with those of pure DLC films as well as with literature values for Me-DLC films prepared with a different hydrocarbon gas or containing other metals.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2017 |
| Autor(en): | Flege, Stefan ; Hatada, Ruriko ; Hanauer, Andreas ; Ensinger, Wolfgang ; Morimura, Takao ; Baba, Koumei |
| Art des Eintrags: | Bibliographie |
| Titel: | Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties |
| Sprache: | Englisch |
| Publikationsjahr: | 23 Januar 2017 |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Advances in Materials Science and Engineering |
| Jahrgang/Volume einer Zeitschrift: | 2017 |
| DOI: | 10.1155/2017/9082164 |
| URL / URN: | https://doi.org/10.1155/2017/9082164 |
| Kurzbeschreibung (Abstract): | Metal-containing diamond-like carbon (Me-DLC) films were prepared by a combination of plasma source ion implantation (PSII) and reactive magnetron sputtering. Two metals were used that differ in their tendency to form carbide and possess a different sputter yield, that is, Cu with a relatively high sputter yield and Ti with a comparatively low one. The DLC film preparation was based on the hydrocarbon gas ethylene (C2H4). The preparation technique is described and the parameters influencing the metal content within the film are discussed. Film properties that are changed by the metal addition, such as structure, electrical resistivity, and friction coefficient, were evaluated and compared with those of pure DLC films as well as with literature values for Me-DLC films prepared with a different hydrocarbon gas or containing other metals. |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik |
| Hinterlegungsdatum: | 21 Jul 2017 08:47 |
| Letzte Änderung: | 31 Jan 2019 06:57 |
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