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Controlled photocorrosion of tungsten diselenide: influence of molecular oxygen

Mahalu, D. and Peisach, M. and Jaegermann, W. and Wold, A. and Tenne, R. (1990):
Controlled photocorrosion of tungsten diselenide: influence of molecular oxygen.
In: The Journal of Physical Chemistry, pp. 8012-8013, 94, (21), ISSN 0022-3654,
[Online-Edition: http://dx.doi.org/10.1021/j100384a005],
[Article]

Item Type: Article
Erschienen: 1990
Creators: Mahalu, D. and Peisach, M. and Jaegermann, W. and Wold, A. and Tenne, R.
Title: Controlled photocorrosion of tungsten diselenide: influence of molecular oxygen
Language: English
Journal or Publication Title: The Journal of Physical Chemistry
Volume: 94
Number: 21
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Surface Science
Date Deposited: 24 Apr 2015 09:59
Official URL: http://dx.doi.org/10.1021/j100384a005
Identification Number: doi:10.1021/j100384a005
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